JPH0230835Y2 - - Google Patents
Info
- Publication number
- JPH0230835Y2 JPH0230835Y2 JP16736683U JP16736683U JPH0230835Y2 JP H0230835 Y2 JPH0230835 Y2 JP H0230835Y2 JP 16736683 U JP16736683 U JP 16736683U JP 16736683 U JP16736683 U JP 16736683U JP H0230835 Y2 JPH0230835 Y2 JP H0230835Y2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- mounting table
- substrate mounting
- heat pipe
- liquid reservoir
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16736683U JPS6076032U (ja) | 1983-10-31 | 1983-10-31 | 半導体製造装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16736683U JPS6076032U (ja) | 1983-10-31 | 1983-10-31 | 半導体製造装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6076032U JPS6076032U (ja) | 1985-05-28 |
JPH0230835Y2 true JPH0230835Y2 (en]) | 1990-08-20 |
Family
ID=30366174
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16736683U Granted JPS6076032U (ja) | 1983-10-31 | 1983-10-31 | 半導体製造装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6076032U (en]) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4778559A (en) * | 1986-10-15 | 1988-10-18 | Advantage Production Technology | Semiconductor substrate heater and reactor process and apparatus |
EP3642869A1 (en) * | 2017-06-23 | 2020-04-29 | Watlow Electric Manufacturing Company | High temperature heat plate pedestal |
-
1983
- 1983-10-31 JP JP16736683U patent/JPS6076032U/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6076032U (ja) | 1985-05-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4430547A (en) | Cleaning device for a plasma etching system | |
US6129046A (en) | Substrate processing apparatus | |
KR100773211B1 (ko) | 피가열물 탑재용 히터 부재 및 그를 이용한 기판 처리 장치 | |
KR970077340A (ko) | 기판위에 증착된 할로겐-도핑층을 안정화하기 위한 방법 및 장치 | |
CN102870205A (zh) | 基板保持装置 | |
JPH0230835Y2 (en]) | ||
KR930002808A (ko) | 텅스텐 박막 제조용 플라즈마 화학증착 온도 측정장치 | |
JPH05212275A (ja) | 加熱処理装置 | |
JP2020202372A (ja) | プラズマ処理装置用セラミック構造体及びその製造方法 | |
JP2000164588A (ja) | 基板加熱方法及び装置 | |
JPS63160355A (ja) | 静電チヤツク | |
JP2951876B2 (ja) | 基板処理方法および基板処理装置 | |
JPS6136931A (ja) | ウエ−ハの温度制御方法 | |
JP2008244389A (ja) | 真空処理装置、真空処理方法及びプラズマcvd方法 | |
JP2545640Y2 (ja) | 圧力変換器 | |
JPH0565586B2 (en]) | ||
JPS60102742A (ja) | 処理装置 | |
JP2001357964A (ja) | 複層セラミックスヒーター | |
JPS63114118A (ja) | 薄膜加工用圧着ヒ−タ支持装置 | |
JPH0982695A (ja) | 半導体製造装置および半導体装置の製造方法 | |
JPS58134431A (ja) | プラズマcvd装置 | |
JPH04162615A (ja) | 半導体製造装置 | |
JP3275330B2 (ja) | 半導体製造装置 | |
JPH041730Y2 (en]) | ||
RU1783334C (ru) | Способ изготовлени емкостного датчика давлени |